Micron plans to bring extreme ultraviolet (EUV) technology to Japan
The 1-gamma node to be produced in Micron’s Hiroshima fab
Micron Technology (Micron) has announced that it will be introducing extreme ultraviolet (EUV) technology to Japan to manufacture its next generation of dynamic random-access memory (DRAM), the 1-gamma (1γ) node, according to a press release May 17.
Thank you for visiting S&P Global AutoTechInsight.
*A subscription to News & Analysis includes four S&P Global-selected sector-specific analytical pieces per month. Access to all analytic pieces across all domains comes with a subscription to All Domains. Please click here to subscribe.
To get access to the AutoTechInsight full suite of services, please contact a sales representative by clicking here.
Already a subscriber? Please log in here
